International Journal of Emerging Research in Management and Technology

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International Journal of Emerging Research in Management and Technology [Impact Factor: 1.492] [Science Central Evaluation Score: 9.28]  (An open access scholarly, online, peer-reviewed, interdisciplinary, monthly, and fully refereed journal.) http://www.ermt.net www.ijermt.com ermtonline@gmail.com CALL FOR PAPER (An ISO 9001: 2008 Certified International Journal) Smooth, Simple and up to date publishing of Review and Research Articles. We are pleased to inform you that IJERMT is going to launch its next issue (Volume 3, Issue 12, and December-2014). We would like to invite you to contribute your Research Paper for publication in IJERMT. Papers published in IJERMT will receive very high publicity and acquire very high reputation. The journal covers all areas of Management, Computer Science, Information technology, Electronics Engineering, Electrical Engineering, Mechanical Engineering, Civil Engineering, Biotechnology, Applied Sciences and many more (http://www.ermt.net). We publish original research articles, review articles and technical notes. The journal reviews papers within one week of submission and publishes accepted articles on the internet immediately upon receiving the final versions. Our fast reviewing process is our strength.  Authors are requested to prepare their manuscript in IJERMT paper format, by using IJERMT paper Template. For author’s convenience, we strongly follow the following steps. 1. Response will be given within 6 hours 2. The paper will be reviewed within 5 days. 3. Author will get their Acceptance/Rejection Notification within 7 days of submitting paper. 4. All the accepted papers will be open accessible with full PDF download. 5. 24*7 Online & Telephonic Research Support. Submission Deadlines: 16th December – 2014 Author Notification: Within 3- 5 days after submission. Online Publishing: 20th December -2014 Submit your manuscript through E-mail atermtonline@gmail.com Home Wafer Processing Lithography Device Architecture Metrology In this issue: • Slideshow: IEDM 2014 Preview • China and US boost worldwide industrial semiconductor market in 2014 • Applied Materials introduces new hardmask process, Saphira • 2014 EUV Source Workshop Summary • EV Group establishes nanoimprint lithography competence center for photonic applications • Cymer announces its new XLR 700ix DUV light source • Van der Waals force re-measured • Protons fuel graphene prospects • North American book-to-bill report shows equipment order activity has moderated • Paul A. Mascarena joins ON Semiconductor • Carbonics aims for improved power consumption and performance with new carbon nanomaterials • SCREEN Semiconductor Solutions and imec sign collaboration agreement for joint R&D on advanced nodes • Dynaloy unveils safer cleaners Share:            Top stories Slideshow: IEDM 2014 PreviewBrowse for an advance look at some of the most newsworthy topics and papers to be presented at the 60th annual meeting, to be held at the Hilton San Francisco Union Square Hotel from December 15-17, 2014.Share:    China and US boost worldwide industrial semiconductor market in 2014Continuing strength in China and a resurgent U.S. economy are combining to drive accelerated growth in the worldwide market for semiconductors used in industrial applications this year, according to IHS Technology.Share:    Applied Materials introduces new hardmask process, SaphiraA new hardmask material, called Saphira, and accompanying processes was introduced Applied Materials. (From SemiMD)Share:    2014 EUV Source Workshop SummaryAt the 2014 Source Workshop in Dublin, the semiconductor industry's largest annual gathering of EUV source experts, we received the latest updates on current EUV source technology (Sn laser-produced plasma [LPP]) and discussed potential and challenges of Free Electron Laser (FEL) based sources as the next generation high power EUV sources.Share:    Tech News EV Group establishes nanoimprint lithography competence center for photonic applicationsEV Group announced that it has established the NILPhotonics Competence Center.Share:    Cymer announces its new XLR 700ix DUV light sourceCymer, LLC announced its new argon fluoride (ArF) immersion light source, the XLR 700ix. Share:    Van der Waals force re-measuredAlthough the van der Waals force was discovered around 150 years ago, it is still difficult to quantify when predicting the behavior of solids, liquids, and molecules. Share:    Protons fuel graphene prospectsPublished in the journal Nature, the discovery could revolutionize fuel cells and other hydrogen-based technologies as they require a barrier that only allow protons - hydrogen atoms stripped off their electrons - to pass through.Share:    Business News North American book-to-bill report shows equipment order activity has moderatedNorth America-based manufacturers of semiconductor equipment posted $1.10 billion in orders worldwide in October 2014 and a book-to-bill ratio of 0.93, according to the October EMDS Book-to-Bill Report published by SEMI. Share:    Paul A. Mascarena joins ON SemiconductorON Semiconductor Corporation announced that Paul A. Mascarenas has joined its Board of Directors. The Board also appointed Mr. Mascarenas to its Science and Technology Committee.Share:    Carbonics aims for improved power consumption and performance with new carbon nanomaterialsStartup is backed by $5.5M investment, leveraging carbon research conducted at UCLA and USC.Share:    SCREEN Semiconductor Solutions and imec sign collaboration agreement for joint R&D on advanced nodesNanoelectronics research center imec announced that SCREEN Semiconductor Solutions Co., Ltd., a leading manufacturer of advanced systems for the semiconductor industry, has joined imec's suppliers hub for joint R&D in cleaning, wet etch and advanced lithography coat/develop processing. Share:    Product News Dynaloy unveils safer cleanersIn response to evolving industry trends and customer preferences for products with better environmental, health, and safety (EHS) profiles, Dynaloy LLC is launching three new formulated products that offer exceptional performance without the use of certain chemicals, while continuing to offer its line of traditional cleaners.Share:    Web Editor Shannon Davis 603-547-5309 sdavis@extensionmedia.com Subscription InformationSST invites you to forward this newsletter to colleagues or associates who might be interested in our weekly news summaries. 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